山东力冠微电子装备

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InP长晶设备

产品应用/Product Applications: ♦适用领域:单晶生长 Relevant Industries:Single Crystal Growth ♦适用材料:Ga2O3、GaAs等 Suitable for Processing: Ga2O3 (Gallium Oxide),GaAS(Gallium Arsenide), etc. ♦晶圆尺寸:12/8/6英寸 Wafer Size: 12/8/6 inch 技术指标/Technical Indicators: ♦制程温度范围:2200°C Process Temperature Range:2200°C ♦加热方式:感应/电阻 Heating Method:Induction/Resistance

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