山东力冠微电子装备

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氧化/扩散/退火炉

适用领域:集成电路、先进封装、化合物半导体 Relevant Industries: Integrated Circuits, Advanced Packaging, Compound Semiconductors 适用材料:  Si、SiC、GaN Suitable for Processing: Silicon (Si), Silicon Carbide (SiC), Gallium Nitride (GaN) 晶圆尺寸:12/8/6英寸 Wafer Size: 8/6 inch 适用工艺:氧化(Oxidation)、退火(Annealing)、固化(Polyimide)、 合金(Alloy)、扩散(Diffusion) Applicable Processes: High-Temperature Annealing

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