RTP快速退火设备

所属分类：

快速退火炉

概要：

◆ 快速退火炉是利用红外热辐射实现快速加热的一种半导体热处理工艺设备，通过灯光辐射型热源功率控制模块装置和专用灯组对位于工艺腔体的半导体硅片进行快速加热来实现稳定的升温过程

关键词：

RTP快速退火

RTP快速退火设备

产品概述/Product Introduction：

Rapid annealing furnace is a kind of semiconductor heat treatment equipment which uses infrared heat radiation to realize rapid heating. The semiconductor silicon wafer located in the process cavity is rapid-ly heated by a light radiation type heat source power control module device and a special lamp group to realize a stable heating process

产品特点/Product Characteristics：

◆ 温度控制精度高、重复性好

High temperature control precision and good repeatability

◆ 干净清洁的工艺腔体

Clean and clean process chamber

◆ 用户可根据要求定制工艺气体,最多可配置6路气体

Users can customize the process gas according to their requirements, and can configure up to 6channels of gas

◆ 工艺过程计算机全自动控制

Computer automatic control of technological process

◆ 样品尺寸:2-6英寸

Sample size: 2-6 inches

◆ 升降温速率:0-100°C/S可控