石墨烯薄膜CVD设备
所属分类：
石墨烯设备
概要：
◆ 本系统是一套完备的石墨烯制备系统,包括硬件和软件部分 ◆ 工作在常压气氛或真空条件，通过控制生长工艺，既可以生长出六边形的石墨烯单晶，也可以生长出花瓣状的石墨烯的单晶
关键词：
石墨烯薄膜CVD
石墨烯薄膜CVD设备
产品概述/Product Introduction：
♦ 本系统是一套完备的石墨烯制备系统，包括硬件和软件部分
This system is a complete graphene preparation system, including hardware and software
♦ 工作在常压气氛或真空条件，通过控制生长工艺，既可以生长出六边形的石墨烯单晶，也可以生长出花瓣状的石墨烯的单晶
Working in normal pressure atmosphere or vacuum condition, by controlling the growth process, both hexagonal graphene single crystal and petal-shaped graphene single crystal can be grown
产品特点/Product Characteristics：
♦ 采用单腔室或双腔室结构
Adopt single chamber or double chamber structure
♦ 取料腔室快速冷却
Rapid cooling of material taking chamber
♦ 该系统主要由电控系统、样品加热系统、工艺腔室系统、取放料系统、真空系统、气路系统、压力控制系统等组成
The system is mainly composed of electric control system, sample heating system, process chambersystem, material taking and discharging system, vacuum system, gas path system, pressure controlsystem and so on
♦ 结构型式:卧式，间歇连续式自动控制
Structure type: Horizontal, intermittent continuous automatic control
♦ 适应材料规格:A3尺寸
Suitable material specifications: A3 size
♦ 装片量:200片
Loading capacity: 200 tablets
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